Article published NANOsciences
Ultra-miniaturisation
Funded by CEA and the Ile-de-France region, the IRAMIS* nanomanufacturing facility combines optical and electronic lithography with thin- film deposition or etching to produce custom electronics with components on the 10-nanometre scale. Modernised in 2007, the laboratory is a certified Proximity Centre and part of the cnrs Laboratory for Photonics and Nanostructures in Marcoussis. It comprises two clean rooms with equipment for optical lithography, thin-film deposition and wet or dry etching, as well as observation and characterisation. Finally, installation of a mask-making tool for electronic lithography is underway. The facility is being opened to the private sector through cooperation with CEA researchers in quantum nanoelectronics, nanomagnetism, spintronics and molecular electronics.
*Saclay Institute of Matter and Radiation.
